Author:
Lemme Max C.,Echtermeyer Tim,Baus Matthias,Szafranek B. N.,Schmidt Mathias,Kurz Heinrich
Abstract
Field effect device (FED) manufactured from monolayer graphene are investigated. A conventional CMOS-compatible top-down process flow is applied, except for graphene deposition. From IVcharacteristics carrier mobilities in graphene pseudo-MOS structures are extracted and compared to state-of-the-art silicon MOSFETs. The extracted values outperform the universal mobility of silicon and silicon-on-insulator MOSFETs.
Publisher
The Electrochemical Society
Cited by
11 articles.
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