Surface Heat Treatment of Silicon Wafer Using a Xenon Arc Lamp and Its Implant Activation Applications-Reference-Cited by-同舟云学术

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Surface Heat Treatment of Silicon Wafer Using a Xenon Arc Lamp and Its Implant Activation Applications

Published:2015-11-03 Issue:2 Volume:5 Page:P1-P5
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Yoo Woo Sik,Kang Kitaek

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Truman J. K. Gronet C. M. Kuan N. L. Czarnik C. M. Miner G. E. Jennings D. C. Beinglass I. , Proc. 7th Int. Conf. on Advanced Thermal Processing of Semiconductors – RTP’99 (Colorado Springs, 1999) 6.

2. Design of Single-Wafer Furnace and Its Rapid Thermal Processing Applications

3. Jennings D. C. de Cock G. Foad M. A. , Proc. 6th Int. Conf. on Advanced Thermal Processing of Semiconductors – RTP’98 (Kyoto, 1998) 187.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multi-channel flow reactor design for the photocatalytic degradation of harmful dye molecules;Journal of Nanoparticle Research;2024-04

2. Room Temperature Photoluminescence Characterization of Silicon Wafers for In-Line Monitoring Applications;ECS Transactions;2017-08-15

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