The Surface of Si(111) during Etching in NaOH Studied by FTIR Spectroscopy in the ATR Technique-Reference-Cited by-同舟云学术

The Surface of Si(111) during Etching in NaOH Studied by FTIR Spectroscopy in the ATR Technique

Published:1993-12-01 Issue:12 Volume:140 Page:L187-L189
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Rappich J.¹²,Lewerenz H. J.¹²,Gerischer H.¹²

Affiliation:

1. Department of Photochemical Energy Conversion, Hahn‐Meitner‐Institut, D‐14091 Berlin (Wannsee), Germany

2. Fritz‐Haber‐Institut der Max‐Planck‐Gesellschaft, D‐14195 Berlin (Dahlem), Germany

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2221161/pdf

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