Deposition Method to Control Plasma‐Enhanced Chemical Vapor Deposition Tetraethylortho Silicate Oxide Charge-Reference-Cited by-同舟云学术

Deposition Method to Control Plasma‐Enhanced Chemical Vapor Deposition Tetraethylortho Silicate Oxide Charge

Published:1993-03-01 Issue:3 Volume:140 Page:774-779
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Carlson Arvid C.¹,Tom Wu T. H.²,Liang Han‐Bin K.³

Affiliation:

1. Motorola Inc. MOS 6‐Manufacturing Technology Line, Mesa, Arizona 85202

2. Motorola Inc. Compound Semiconductor One, Tempe, Arizona 85284

3. Motorola Inc. Advanced Custom Technologies, Mesa, Arizona 85202

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2056157/pdf

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