Affiliation:
1. Nippon Telegraph and Telephone Public Corporation, Musashino Electrical Communication Laboratory, Musashino‐shi, Tokyo 180 Japan
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
17 articles.
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1. In situ electron cyclotron resonance plasma surface cleaning of silicon;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1994-07
2. Cleaning of silicon surfaces by argon microwave multipolar plasmas excited by distributed electron cyclotron resonance;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-05
3. An Overview of Dry Etching Damage and Contamination Effects;Journal of The Electrochemical Society;1990-12-01
4. Determination of sputter damage on InP by MAI ellipsometry;Surface and Interface Analysis;1990-07
5. Surface modification by plasmas: X-ray photoemission studies;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1989-09