Author:
Asano Tanemasa,Ishida Yuji
Abstract
This paper reviews electro-static inkjet and its application to location controlled growth of poly-crystalline Si grains for thin-film transistor application. The electro-static inkjet using a needle head enables us to draw dot patterns whose dimension is in the deep submicron region. Ejection of a Ni-nanoparticle solution using the head to the surface of a-Si produces single-grains at the printed sites as was demonstrated by Ni nano-imprint technology.
Publisher
The Electrochemical Society
Cited by
2 articles.
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