Surface Contaminant Detection in Semiconductors Using Noncontacting Techniques-Reference-Cited by-同舟云学术

Surface Contaminant Detection in Semiconductors Using Noncontacting Techniques

Published:2003 Issue:8 Volume:150 Page:G456
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Cavalcoli D.,Cavallini A.,Rossi M.,Binetti S.,Izzia F.,Pizzini S.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. The International Technology Roadmap for Semiconductors, http://public.itrs.net/files/1999_SIA_Roadmap/DRT.pdf, International Sematech, Austin, TX (2001).

2. L. W. Shive, R. E. Blank, and K. H. Lamb,Micro Magazine.com, 〈http://www.micromagazine.com/archive/01/03/shive.html〉, Canon Communication (2001).

3. H. Nagel, RWE Schott Solar, Private communication.

4. GL Sciences, Inc,Silicon Wafer Analyzer SWA-256, http://www.gls.co.jp/index_e.html. Tokyo, Japan (2002).

5. A novel detection system for defects and chemical contamination in semiconductors based upon the Scanning Kelvin Probe

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2. Simultaneous qualitative analysis of volatile and nonvolatile organic contamination on silicon wafer by online pyrolysis mass spectrometry;IEEE Transactions on Device and Materials Reliability;2005-12

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