A Direct Approach for Evaluating the Thermal Condition of a Silicon Substrate under Infrared Rays and Specular Reflectors-Reference-Cited by-同舟云学术

A Direct Approach for Evaluating the Thermal Condition of a Silicon Substrate under Infrared Rays and Specular Reflectors

Published:1999-02-01 Issue:2 Volume:146 Page:713-718
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Habuka Hitoshi¹,Otsuka Toru¹,Mayusumi Masanori¹,Shimada Manabu²,Okuyama Kikuo²

Affiliation:

1. Shin‐Etsu Handotai Company, Limited, Isobe Research and Development Center, Annaka, Gunma 379-0196, Japan

2. Department of Chemical Engineering, Faculty of Engineering, Hiroshima University, Higashi‐Hiroshima, Hiroshima 739-8527, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391669/pdf

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