Effects of Nonionic Surfactants on Oxide-to-Polysilicon Selectivity during Chemical Mechanical Polishing-Reference-Cited by-同舟云学术

Effects of Nonionic Surfactants on Oxide-to-Polysilicon Selectivity during Chemical Mechanical Polishing

Published:2002 Issue:8 Volume:149 Page:G477
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Lee Jae-Dong,Park Young-Rae,Yoon Bo Un,Han Yong-Pil,Hah SangRok,Moon Joo-Tae

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference12 articles.

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2. Y. Wu, G. Brooks, T. Chamberlin, and M. Lube, inProceedings of the 5th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, IEEE, p. 140, March 2-3, 2000.

3. R. Hrinvivasan., W. G. America, Y. Her, and S. V. Babu, inProceedings of the 5th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, IEEE, p. 148, March 2-3, 2000.

4. A. Romer, T. Donohue, J. Gagliardi, F. Weimar, P. Thieme, and M. Hollatz, inProceedings of the 5th International Chemical-Mechanical Planarization for ULSI Multilevel Interconnection Conference, IEEE, p. 265, March 2-3, 2000.

5. H. Nojo, M. Kodera and R. Nakata,Tech. Dig. - Int. Electron Devices Meet.,1996, 349.

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