Batch Reactor Kinetic Studies of Tungsten LPCVD from Silane and Tungsten Hexafluoride
Author:
Affiliation:
1. Department of Chemical and Bioresource Engineering, Colorado State University, Fort Collins, Colorado 80523
2. Institute of Physics, Technical University of Wroclaw, 50‐370 Wroclaw, Poland
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/1.1836426/pdf
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3. Nucleation and growth during tungsten atomic layer deposition on SiO2 surfaces;Thin Solid Films;2001-05
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