Author:
Kuchumov Boris M.,Koretskaya Tat'yana P.,Shevtsov Yuriy V.,Trubin Sergey V.,Zharkova Galina I.,Danilovich Vladimir S.,Igumenov Igor K.,Kruchinin Vladimir
Abstract
Attention to low-temperature processes of metal film deposition is due to the necessity to obtain electrically conducting layers on different surfaces including those containing polymeric regions. The use of a highly volatile precursor, for example Pd(hfa)2, with simultaneous stimulation of its decomposition in the atmosphere of hydrogen using the VUV radiation of excimer lamps with the wavelength 116 to 126 nm allows one to decrease the temperature for the deposition of mirror metal films. In the present work, the composition and morphology of palladium films are examined by means of scanning electron microscopy, ESCA, spectral ellipsometry, depending on the temperature of substrate and precursor, deposition time, flow rates of hydrogen and argon. The nature of the substrate, its activation by VUV radiation allow selective deposition of palladium films on combined substrates (metal - polymer) with a complicated spatial relief.
Publisher
The Electrochemical Society
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献