Author:
Henderson Lucas B.,Ekerdt John G.
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference24 articles.
1. Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers
2. Structure and growth mode of metastable fcc cobalt ultrathin films on Cu(001) as determined by angle-resolved x-ray photoemission scattering
3. Effect of interface modification on EM-induced degradation mechanisms in copper interconnects
4. C.-K. Hu, D. Canaperi, S. T. Chen, L. M. Cignac, B. Herbst, S. Kaldor, M. Krishnan, E. Liniger, D. L. Rath, D. Restaino, et al. , in
IEEE 2004 International Reliability Physics Symposium Proceedings
, IEEE, p. 222 (2004).
5. Reduced Cu interface diffusion by CoWP surface coating
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