Composition, Kinetics, and Mechanism of Growth of Chemical Vapor‐Deposited Aluminum Nitride Films-Reference-Cited by-同舟云学术

Composition, Kinetics, and Mechanism of Growth of Chemical Vapor‐Deposited Aluminum Nitride Films

Published:1982-05-01 Issue:5 Volume:129 Page:1045-1052
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Pauleau Y.¹²,Bouteville A.¹²,Hantzpergue J. J.¹²,Remy J. C.¹²,Cachard A.¹²

Affiliation:

1. Laboratoire de Physico‐Chimie Minérale et de Thermodynamique, Université d'Angers, U.E.R. Sciences et Techniques, 49045 Angers, France

2. Département de Physique des Matériaux, C.N.R.S., 69621 Villeurbanne, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2124013/pdf

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