Micropattern Formation on ZnO Films Using a Photodissolution Reaction-Reference-Cited by-同舟云学术

Micropattern Formation on ZnO Films Using a Photodissolution Reaction

Published:1996-11-01 Issue:11 Volume:143 Page:3743-3746
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Futsuhara Masanobu¹²,Yoshioka Katsuaki²,Ishida Yutaka²,Takai Osamu¹,Hashimoto Kazuhito³,Fujishima Akira³

Affiliation:

1. Department of Materials Processing Engineering, School of Engineering, Nagoya University, Chikusa‐ku, Nagoya 464‐01, Japan

2. Nippon Paint Company, Limited, Coating Design Institute, Shinagawa‐ku, Tokyo 140, Japan

3. Department of Applied Chemistry, Faculty of Engineering, The University of Tokyo, Bunkyo‐ku, Tokyo 113, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837282/pdf

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