Characterization of Ammonium Silicate Residue during Polysilazane (PSZ) Dry Etching in NF3/ H2O Gas Chemistry
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Published:2017-08-15
Issue:2
Volume:80
Page:211-219
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ISSN:1938-6737
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Container-title:ECS Transactions
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language:en
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Short-container-title:ECS Trans.
Author:
Kim Hyun-Tae,Kim Min-Su,Lee Jong-Seok,Choi Geun-Min,Park Jin-Goo
Publisher
The Electrochemical Society