Mechanism of Addition Agent Reaction in Bright and Leveling Nickel Deposition-Reference-Cited by-同舟云学术

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Mechanism of Addition Agent Reaction in Bright and Leveling Nickel Deposition

Published:1961 Issue:8 Volume:108 Page:758
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Beacom Se ward E.,Riley Bernard J.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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