Thickness Dependence of Indium-Tin Oxide Thin Films Deposited by RF Magnetron Sputtering

Abstract

Indium-tin oxide is a ceramic material that exhibits electrical conductivity and optical transparency. It is used as transparent electrode in many optoelectronic devices. Among the possible deposition methods, magnetron sputtering is one of the most attractive techniques due to its good reproducibility and possibility of uniform deposition over large areas. In this work, indium-tin oxide thin films with different deposition times were obtained by radio frequency magnetron sputtering without intentional substrate heating. Their optical, electrical, physical and chemical properties were investigated.