Author:
Isomae Seiichi,Ishida Hidetsugu,Itoga Toshihiko,Hozawa Kazuyuki
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference31 articles.
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3. Oxygen Precipitation Factors in Silicon
4. Depth profiles of interstitial oxygen concentrations in silicon subjected to three‐step annealing
5. T. Y. Tan, inDefects in Silicon II, W. M. Bullis, U. Gösele, and F. Shimura, Editors, PV 91-9, p. 613, The Electrochemical Society Proceedings Series, Pennington, NJ (1991).
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19 articles.
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