Rearrangement of Fringing Field by Sidewall Passivated Metal Gate in MIS Tunnel Diode
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Published:2017-04-26
Issue:5
Volume:77
Page:99-107
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ISSN:1938-6737
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Container-title:ECS Transactions
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language:en
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Short-container-title:ECS Trans.
Author:
Chou Chia-Ju,Hwu Jenn-Gwo
Publisher
The Electrochemical Society