EPI Surface Particle Reduction on NROM Word Line Application
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Published:2012-03-16
Issue:1
Volume:44
Page:149-152
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ISSN:1938-5862
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Container-title:ECS Transactions
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language:
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Short-container-title:ECS Trans.
Author:
Yang He,Tang Ji Y.,Wang Chenyu,Li David,Hu Bruce,Li Peng
Abstract
Epitaxy (Epi) technology is widely used for Logic, DRAM and Flash memory process in semiconductor manufacturing industry. Reduced pressure Epi chamber of Applied Materials applied for NROM Flash memory application is introduced, and particle issue occurred during Word Line poly-silicon deposition process is solved.
Publisher
The Electrochemical Society