Ion‐Beam Etching of InP and Its Application to the Fabrication of High Radiance InGaAsP / InP Light Emitting Diodes

Author:

Wada Osamu1

Affiliation:

1. Fujitsu Laboratories Limited, 1677, Ono, Atsugi 243‐01, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

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