Effect of Furnace Preanneal and Rapid Thermal Annealing on Arsenic‐Implanted Silicon-Reference-Cited by-同舟云学术

Effect of Furnace Preanneal and Rapid Thermal Annealing on Arsenic‐Implanted Silicon

Published:1985-05-01 Issue:5 Volume:132 Page:1201-1206
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Kwor R.¹²³,Kwong D. L.¹²³,Ho C. C.¹²³,Tsaur B. Y.¹²³,Baumann S.¹²³

Affiliation:

1. Department of Electrical Engineering, University of Notre Dame, Notre Dame, Indiana 46556

2. Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173

3. Charles Evans and Associates, San Mateo, California 94402

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2114059/pdf

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