Visualizing Slurry Flow in Chemical Mechanical Planarization via High-Speed Videography-Reference-Cited by-同舟云学术

Visualizing Slurry Flow in Chemical Mechanical Planarization via High-Speed Videography

Published:2018 Issue:3 Volume:7 Page:P118-P124
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Bengochea Leticia Vazquez^ORCID,Sampurno Yasa,Stuffle Calliandra^ORCID,Han Ruochen^ORCID,Rogers Chris,Philipossian Ara

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Markets and markets, SE 3820, (2015). Available from: https://www.prnewswire.com/news-releases/chemical-mechanical-planarization-market-worth-494-billion-by-2020-531489351.html.

2. Roberts B. , Available from: http://techcet.com/wp-content/uploads/2014/10/TECHCETCMPUGBerninFranceR2rev1101014BRoberts.pdf (2014).

3. Effect of pad groove width on slurry mean residence time and slurry utilization efficiency in CMP

4. Analysis of flow between a wafer and pad during CMP processes

5. Hydrodynamics of Slurry Flow in Chemical Mechanical Polishing

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1. Chemical Mechanical Polishing;Wafer Manufacturing;2021-01-09

2. Inferences of Slurry Bow Wave Width from Mean Coefficient of Friction and Directivity in Chemical Mechanical Planarization;ECS Journal of Solid State Science and Technology;2018-12-19

3. An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments;Nanoscale;2018

4. Effect of Retaining Ring Slot Designs, Conditioning Discs and Conditioning Schemes on the Slurry Bow Wave Width during Chemical Mechanical Planarization;ECS Journal of Solid State Science and Technology;2018