Author:
Dupuis Russell D.,Shen Shyh-Chiang,Lochner Zachary M.,Kim Hee-Jin,Lee Yi-Chi,Zhang Yun,Wang Cheng-Yin,Ryou Jae-Hyun
Abstract
This paper will discuss recent progress in technology development for two key III-Nitride (III-N) transistor technologies: high-voltage AlGaN/GaN heterojunction field-effect transistors (HFETs) and GaN/InGaN RF heterojunction bipolar transistors (HBTs).
Publisher
The Electrochemical Society
Cited by
1 articles.
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