Damage-Free Design of a Megasonic Waveguide for Single-Wafer Processing-Reference-Cited by-同舟云学术

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Damage-Free Design of a Megasonic Waveguide for Single-Wafer Processing

Published:2010 Issue:6 Volume:13 Page:H222
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Ahn Youngki,Yoo Donghyun,Yang Jichul,Min Jaewon,Kim Jeongin,Lee Heemyung,Kulkarni Atul,Kim Taesung

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference14 articles.

1. The International Technology Roadmap for Semiconductors, http//public.itrs.net, (2008).

2. Megasonic cleaning of wafers in electrolyte solutions: Possible role of electro-acoustic and cavitation effects

3. Experimental and Numerical Investigation of Nanoparticle Removal Using Acoustic Streaming and the Effect of Time

4. Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and its Effect on Particle Removal

5. Design and fabrication of an L-type waveguide megasonic system for cleaning of nano-scale patterns

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overview and Evolution of Silicon Wafer Cleaning Technology ∗;Handbook of Silicon Wafer Cleaning Technology;2018

2. Enhanced megasonic processing of wafers in MegPie® using carbonated ammonium hydroxide solutions;Microelectronic Engineering;2014-02

3. Dependency of the Underlying Surface Condition on Dielectric Film Removal at Wafer Edge;ECS Journal of Solid State Science and Technology;2013-12-24

4. Development of CO2 gas cluster cleaning method and its characterization;Microelectronic Engineering;2013-02

5. Numerical Simulation of Ultrasonic Generator in Dust Removing System;Advanced Materials Research;2012-03

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