(Invited)Development of Plasma Atomic Layer Etching in Close-to-Conventional Etch Tools
-
Published:2018-04-09
Issue:6
Volume:85
Page:71-76
-
ISSN:1938-6737
-
Container-title:ECS Transactions
-
language:en
-
Short-container-title:ECS Trans.
Author:
Cooke Mike,Goodyear Andy
Publisher
The Electrochemical Society