Author:
Yu Hyun-Yong,Park Jin-Hong,Okyay Ali K.,Saraswat Krishna
Abstract
We demonstrate a promising approach for the monolithic integration of Ge-based nanoelectronics and nanophotonics with Silicon: the selective deposition of Ge on Si by Multiple Hydrogen Annealing for Heteroepitaxy (MHAH). Very high quality Ge layers can be selectively integrated on Si CMOS platform with this technique. We confirm the reduction of dislocation density in Ge layers using AFM surface morphology study. In addition, in situ doping of Ge layers is achieved and MOS capacitor structures are studied.
Publisher
The Electrochemical Society
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献