Kinetics of Silicon Growth under Low Hydrogen Pressure-Reference-Cited by-同舟云学术

Kinetics of Silicon Growth under Low Hydrogen Pressure

Published:1978-04-01 Issue:4 Volume:125 Page:637-644
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Duchemin M. Jean‐Pascal¹,Bonnet M. Michel¹,Koelsch M. François¹

Affiliation:

1. Thomson CSF, Département Microélectronique Hyperfréquence, Domaine de Corbeville, 91401 Orsay, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2131515/pdf

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