Wet Chemical Etching for V‐grooves into InP Substrates-Reference-Cited by-同舟云学术

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Wet Chemical Etching for V‐grooves into InP Substrates

Published:1998-08-01 Issue:8 Volume:145 Page:2931-2937
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Wang J.¹,Thompson D. A.¹,Simmons J. G.¹

Affiliation:

1. Center for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Hamilton, Ontario L8S 4L7, Canada

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1838739/pdf

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. GaAs yarıiletken yüzeyinde mikro yarıkların üretilmesi ve FLIM tekniği ile yüzey karakterizasyonu;Ömer Halisdemir Üniversitesi Mühendislik Bilimleri Dergisi;2022-05-09

2. Critical Casimir forces between planar and crenellated surfaces;Journal of Physics: Condensed Matter;2015-05-12

3. Patterning of pyramidal recesses in (100)InP substrate;Microelectronic Engineering;2011-01

4. Morphology Evolution of One-Dimensional-Based ZnO Nanostructures Synthesized via Electrochemical Corrosion;The Journal of Physical Chemistry C;2009-08-06

5. Localised etching of (100) GaAs via an AlAs sacrificial layer;2008 International Conference on Advanced Semiconductor Devices and Microsystems;2008-10

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