Author:
Alexandrov Sergei,Filatov Leonid A.,Protopopova Vera,Baryshnikova Marina
Abstract
The effect of ozone on chemical vapor deposition of titanium dioxide films from titanium tetraisopropoxide (TTIP) has been experimentally studied. The influence of process parameters on the growth rate, structural and optical properties of TiO2 films deposited in the TTIP-Ar, TTIP-O2-Ar and TTIP-O2-O3-Ar reaction systems have been compared taking into account the results of FTIR measurements of the reaction gas phase. Ozone allows to decrease minimal deposition temperature providing formation of high quality titanium dioxide films to 240 {degree sign}C.
Publisher
The Electrochemical Society
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献