Abstract
The electrodeposition of W was studied in detail using CsF–CsCl–WO3. Prior to electrodeposition, the WO3 solubility was confirmed to be 1.0 mol% at 773 K and increase with temperature. To investigate the effect of temperature on the crystal structure, electrodeposition was conducted at 6–25 mA cm−2 between 773 and 923 K with a unified charge density of 90 C cm−2. X-ray diffraction analysis confirmed that the crystal structures of the electrodeposited W films were β-W at 773 and 823 K, a mixed phase (α-W and β-W) at 873 K, and α-W at 923 K. The shape of the crystal grains varied with temperature: grains of β-W obtained at 773 and 823 K were spherical, while those of α-W obtained at 923 K were angular. Scanning electron microscopy observations showed that W films with smoother surfaces were obtained at lower current densities at all temperatures. In particular, a dense and smooth W film (surface roughness: 0.66 μm, thickness: 10 μm) was obtained at 6 mA cm−2 and 773 K. When the charge density was increased to 210 C cm−2 at 6 mA cm−2 and 773 K, a W film with a smooth surface and thickness of 30 μm was obtained.
Funder
Sumitomo Electric Industries, Ltd
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
3 articles.
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