Abstract
In this paper, we developed a high performance NiOx extended-gate field-effect transistor (EGFET) biosensor for detection of uric acid. The structural and sensing properties of the NiOx sensing film deposited on a n+-type Si substrate was examined for an EGFET pH sensor. X-ray diffraction, atomic force microscope and X-ray photoelectron spectroscopy were used to analyze the film features of the NiOx sensing film. The NiOx sensing film based on EGFET exhibited a high pH sensitivity of 58.53 mV pH−1, a small hysteresis voltage of 1.4 mV and a low drift rate of 0.30 mV h−1. Moreover, the NiOx EGFET biosensor showed a high linearity in the uric acid range between 1 and 30 mg dl−1. In addition, this NiOx EGFET biosensor demonstrated a very good selectivity to uric acid over other interfering substrates (ascorbic acid, glucose, urea).
Funder
Ministry of Science and Technology
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献