Investigation of Conditions for Preparation of Ordered Nanohole Arrays by Anodization of Iron Substrates with Depression Patterns

Abstract

Ordered iron oxide nanohole arrays were fabricated by the anodization of iron substrates with depression patterns formed by Ar ion milling with alumina masks in an ethylene glycol electrolyte containing NH4F and H2O. It was found that the optimization of anodization voltage, NH4F and H2O concentrations in the electrolyte, and electrolyte temperature is necessary to achieve straight pore growth induced from the depression patterns in the depth direction. The optimization of the anodization conditions enabled the formation of ordered iron oxide nanohole arrays with aspect ratios exceeding 10. The resulting ordered iron oxide nanohole arrays with high aspect ratios are expected to be applied to various functional devices such as photocatalysts and solar cells.