Development of an Automatic Modeling System for Reaction Mechanisms in CVD Processes

Abstract

In this study, we propose a system that automatically identifies the reaction models involved in the deposition of films on substrates with nanometer- or micrometer-sized trenches by chemical vapor deposition (CVD) processes; automatic modeling is achieved by the system through the analysis of the experimental data of the cross-sectional shapes of the deposited films. The reaction models, which comprise various deposition species and surface reactions with different values of sticking coefficient, were determined both quantitatively and qualitatively on the basis of chemical kinetics. We demonstrated that the system could successfully model the reaction mechanisms.