Electrochemical Investigation of Copper Contamination on Silicon Wafers from HF Solutions-Reference-Cited by-同舟云学术

Electrochemical Investigation of Copper Contamination on Silicon Wafers from HF Solutions

Published:1996-09-01 Issue:9 Volume:143 Page:2870-2875
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Jeon Joong S.¹,Raghavan Srini¹,Parks Harold G.²,Lowell John K.¹²³⁴,Ali Iqbal¹²³⁴

Affiliation:

1. Department of Materials Science and Engineering, University of Arizona, Tucson, Arizona 85721

2. Department of Electrical and Computer Engineering, University of Arizona, Tucson, Arizona 85721

3. Advanced Micro Devices, Austin, Texas 78741

4. Texas Instruments, Dallas, Texas 75265

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837120/pdf

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