Author:
Ryu Hyun-Kyu,Lee Byung-Seok,Park Sung-Ki,Kim Il-Wook,Kim Chang-Koo
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference14 articles.
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2. Highly Selective SiO2Etching Using CF4/C2H4
3. Characterization of Dielectric Etching Processes by X-Ray Photoelectron Spectroscopy Analyses in High Aspect Ratio Contact Holes
4. Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-µm-Diameter Range
5. Evaluation of C[sub 4]F[sub 8]O as an Alternative Plasma-Enhanced Chemical Vapor Deposition Chamber Clean Chemistry
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