Investigation on the Distribution of Fluorine and Boron in Polycrystalline Silicon/Silicon Systems-Reference-Cited by-同舟云学术

Investigation on the Distribution of Fluorine and Boron in Polycrystalline Silicon/Silicon Systems

Published:1995-06-01 Issue:6 Volume:142 Page:2000-2006
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Chen T. P.¹²,Lei T. F.¹²,Chang C. Y.¹²,Hsieh W. Y.¹²,Chen L. J.¹²

Affiliation:

1. Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, and National Nano Device Laboratory, Hsinchu, Taiwan

2. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2044231/pdf

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