(Invited) Reactivity of Water Vapor with Ultrathin GeO2/Ge and SiO2/Si Structures Investigated by Near-Ambient-Pressure X-ray Photoelectron Spectroscopy
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Published:2017-08-15
Issue:2
Volume:80
Page:131-140
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ISSN:1938-6737
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Container-title:ECS Transactions
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language:en
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Short-container-title:ECS Trans.
Author:
Arima Kenta,
Hosoi Takuji,
Watanabe Heiji,
Crumlin Ethan JORCID
Publisher
The Electrochemical Society