Chemical Mechanical Polishing of Methyl Silsesquioxane-Reference-Cited by-同舟云学术

Chemical Mechanical Polishing of Methyl Silsesquioxane

Published:2009 Issue:6 Volume:156 Page:H460
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Meled V.,Babu S. V.,Matijević E.

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference24 articles.

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4. Chemical-Mechanical Polishing 2001: Advances and Future Challenges, Materials Research Society Symposium Proceedings, S. V. Babu , K. C. Cadien , and H. Yano , Editors, Vol. 671, Materials Research Society, Warrendale, PA (2001).

5. Chemical-Mechanical Polishing 2004: Integration, Technology and Reliability, Materials Research Society Symposium Proceedings Series, A. Kumar , J. A. Lee , Y. S. Obeng , I. Vos , and E. C. Johns , Editors, Vol. 867, Materials Research Society, Warrendale, PA (2004).

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