Structural Perfection Testing of Films and Wafers by Means of Optical Scanner-Reference-Cited by-同舟云学术

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Structural Perfection Testing of Films and Wafers by Means of Optical Scanner

Published:1984-07-01 Issue:7 Volume:131 Page:1693-1699
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Steigmeier E. F.¹,Auderset H.¹

Affiliation:

1. Laboratories RCA Limited, CH‐8048 Zurich, Switzerland

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2115940/pdf

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of molecular layers on a liquid surface by light scattering;Thin Solid Films;1992-04

2. Light scattering topography and photoluminescence topography;Applied Physics A Solids and Surfaces;1990-06

3. Optical Characterization of Silicon Materials and Structures;Semiconductor Silicon;1989

4. MEASUREMENT OF ION IMPLANTATION;Ion Implantation Science and Technology;1988

5. Angle-resolved light scattering studies of silicon-on-sapphire;Journal of Crystal Growth;1987-07

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