Author:
You Lin,Okoro Chukwudi A,Ahn Jung-Joon,Kopanski Joseph J.,Obeng Yaw S.
Abstract
In this paper we describe the development of a suite of techniques, based on the application of high frequency electromagnetic waves (RF), to probe material and structural changes in integrated circuits under various external perturbations. We discuss how RF insertion loss (S21) based-techniques have been used to study the impact of thermal cycling on the thermo-mechanical reliability of Cu TSV-based interconnects in 3D-ICs. In addition, we demonstrate, with preliminary data, how Scanning Microwave Spectroscopy (based around RF reflectance (S11)) can be used to detect buried artifacts and characterize metallic contacts.
Publisher
The Electrochemical Society
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献