Study to Transfer 0.11μm DRAM ArF Process to KrF Process in Litho

Abstract

To improve the 0.11μm DRAM capacity of foundry and save cost, with series of tests, we successfully transferred 0.11μm DRAM M0 (Bit Line) layer lithography process from the ArF(NA=0.7) process to high NA (0.8) KrF process.