Effect of Material Heating on Fabrication of ZnO Thin Films Using Cold He Plasma at Atmospheric Pressure-Reference-Cited by-同舟云学术

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Effect of Material Heating on Fabrication of ZnO Thin Films Using Cold He Plasma at Atmospheric Pressure

Published:2005 Issue:3 Volume:54 Page:279-283
ISSN:0514-5163
Container-title:Journal of the Society of Materials Science, Japan
language:
Short-container-title:J. Soc. Mat. Sci., Japan

Author:

SHIKAMA Tomokazu,SUZAKI Yoshifumi,EJIMA Seiki,IDE Yasuaki,AZUMA Syunryou,TANAKA Osamu,KAJITANI Takahiro,KOINUMA Hideomi

Publisher

Society of Materials Science, Japan

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference9 articles.

1. Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties

2. Optical and electrical properties of direct-current magnetron sputtered ZnO:Al films

3. Piezoelectric Properties of ZnO Films on a Sapphire Substrate Deposited by an RF-Magnetron-Mode ECR Sputtering System

4. Correlation between grain size and optical properties in zinc oxide thin films

5. Deposition of ZnO Film by Using an Atomospheric Pressure Cold Plasma Generator.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of substrate temperature on ZnO thin film fabrication by using an atmospheric pressure cold plasma generator;physica status solidi (c);2010-11-15

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