Does Erbium:Yttrium–Aluminum–Garnet Laser to Enamel improve the Performance of Etch-and-rinse and Universal Adhesives?

Abstract

ABSTRACT Aim This study aims to evaluate the effect of erbium: Yttrium–aluminum–garnet (Er:YAG) laser irradiation on the enamel microshear bond strength (µSBS), followed by the utilization of etch-and-rinse and universal adhesive systems. Materials and methods A total of 32 molars were sectioned in the mesiodistal direction producing 64 samples that were randomized into two groups (n = 32): single bond 2 (SB2) (etch-and-rinse system; 3M), SB universal (SBU) (universal etching system; The SB2 and SBU groups were then divided into two subgroups (n = 16): (i) enamel was irradiated with an Er:YAG laser (λ = 2.94 μm, 60 mJ, 10 Hz), and (ii) enamel served as a control. The samples were restored with TPH3 (Dentsply), stored in artificial saliva for 24 hours, and subjected to a microshear test. Results Kruskal–Wallis (p < 0.05) and Mann–Whitney U tests indicated no significant differences in μSBS between the groups, and the fractures were predominately at the resin–enamel interface. Conclusion The previous irradiation of enamel with Er:YAG laser does not interfere with the performance of simplified two-step etch-and-rinse and universal adhesive systems. Clinical significance The increasing use of Er:YAG laser is important to evaluate the influence of this irradiation on the adhesion of restorative materials. Thus, to obtain the longevity of the restorative procedures, it is necessary to know the result of the association of the present adhesive systems to the irradiated substrate. How to cite this article De Jesus Tavarez RR, Rodrigues LLC, Diniz AC, Lage LM, Torres CRG, Bandeca MC, Firoozmand LM. Does Erbium:Yttrium–Aluminum–Garnet Laser to Enamel improve the Performance of Etch-and-rinse and Universal Adhesives? J Contemp Dent Pract 2018;19(3):278-282.