Thermal Stability and High-Temperature Tribological Properties of a-C:H and Si-DLC Deposited by Microwave Sheath Voltage Combination Plasma
Author:
Publisher
Japanese Society of Tribologists
Subject
Surfaces, Coatings and Films
Reference19 articles.
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4. [4] Camargo Jr, S. S., Baia Neto, A. L., Santos, R. A., Freire Jr. A. L., Carius, R. and Finger, F., “Improved High-Temperature Stability of Si Incorporated a-C:H Films,” Diamond Relat. Mater., 7, 8, 1998, 1155-1162.
5. [5] Damasceno, J. C., Camargo Jr, S. S., Freire Jr, F. L. and Carius, R., “Deposition of Si-DLC Films with High Hardness, Low Stress and High Deposition Rates,” Surf. Coat. Technol., 133-134, 2000, 247-252.
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