Effects of Post-Deposition Annealing Temperatures on the Composition of Interfacial Layer at Germanium (Ge)/Aluminium Oxide (Al2O3)-Reference-Cited by-同舟云学术

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Effects of Post-Deposition Annealing Temperatures on the Composition of Interfacial Layer at Germanium (Ge)/Aluminium Oxide (Al2O3)

Published:2019-06-30 Issue:6 Volume:48 Page:1195-1199
ISSN:0126-6039
Container-title:Sains Malaysiana
language:
Short-container-title:JSM

Author:

Sahari Siti Kudnie,Nik Zaini Fathi Nik Amni Fathi,Hamzah Azrul Azlan,Mohamed Sutan Norsuzailina,Embong Zaidi,Mohamed Sultan Suhana,Kashif Muhammad,Sawawi Marini,Hasanah Lilik,Sapawi Rohana,Kipli Kuryati,Kram Abdul Rahman,Junaidi Nazreen

Publisher

Penerbit Universiti Kebangsaan Malaysia (UKM Press)

Subject

Multidisciplinary

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Recovery and enrichment of valuable metals from zinc oxide dust and mitigation of toxicity based on tartaric acid and hydrogen peroxide;Separation and Purification Technology;2025-01

2. An original strategy and evaluation of a reaction mechanism for recovering valuable metals from zinc oxide dust containing intractable germanide;Journal of Hazardous Materials;2024-04

3. Effects of Ge-related storage centers formation in Al2O3 enhancing the performance of floating gate memories;Applied Surface Science;2021-03

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