The Behaviour of the Apparent Chemical Sputtering Yield in the JET Tokamak-Reference-Cited by-同舟云学术

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The Behaviour of the Apparent Chemical Sputtering Yield in the JET Tokamak

Published:1999 Issue:1 Volume:T81 Page:54
ISSN:0031-8949
Container-title:Physica Scripta
language:en
Short-container-title:Physica Scripta

Author:

Monk R. D.,Amiss C. H.,Guo H. Y.,Matthews G. F.,McCracken G. M.,Stamp M. F.

Publisher

IOP Publishing

Subject

Condensed Matter Physics,Mathematical Physics,Atomic and Molecular Physics, and Optics

Link

http://stacks.iop.org/1402-4896/1999/i=T81/a=010/pdf

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