The Dry Etching Characteristics of TiO2Thin Films in N2/CF4/Ar Plasma-Reference-Cited by-同舟云学术

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The Dry Etching Characteristics of TiO2Thin Films in N2/CF4/Ar Plasma

Published:2014-02-25 Issue:1 Volume:15 Page:32-36
ISSN:1229-7607
Container-title:Transactions on Electrical and Electronic Materials
language:en
Short-container-title:Transactions on Electrical and Electronic Materials

Author:

Choi Kyung-Rok,Woo Jong-Chang,Joo Young-Hee,Chun Yoon-Soo,Kim Chang-Il

Publisher

The Korean Institute of Electrical and Electronic Material Engineers

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://ocean.kisti.re.kr/downfile/crosscheck/kieeme/JAKO201408439035835.pdf

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low loss TiO2 channel waveguides;Integrated Optics: Devices, Materials, and Technologies XXIV;2020-02-25

2. Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas;Plasma Chemistry and Plasma Processing;2016-08-02

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