GAS-PHASE PARAMETERS AND SILICON ETCHING KINETICS IN C6F12O + O2 PLASMA
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Published:2022
Issue:
Volume:
Page:
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ISSN:0579-2991
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Container-title:ChemChemTech
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language:
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Short-container-title:IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII KHIMIYA KHIMICHESKAYA TEKHNOLOGIYA
Publisher
Ivanovo State University of Chemistry and Technology
Subject
General Chemical Engineering,General Chemistry