MODIFICATION OF TRACK-ETCHED MEMBRANES BY LOW-TEMPERATURE PLASMA

Abstract

Published data appearing in the last decade on the modification of track-etched membranes with the use of low-temperature plasma are considered. Some schematic description of setups and methods for sample processing in discharges of various types in atmosphere of non-polymerizing gases and by plasma polymerization, also by using of such plasma-chemical methods as magnetron sputtering of polymer targets and electron-beam dispersion of polymers in vacuum are presented. Some modern physicochemical methods for studying of changes occurring on the surface of membranes are described. Some typical examples of changes in the contact properties of the track-etched membrane surface and their chemical composition by means of X-ray photoelectron spectroscopy and Fourier-IR spectroscopy are given. Using the methods of atomic force microscopy and electron microscopy, some examples of morphological changes occurring on the surface of track membranes and in the volume of pores are presented. It is shown that the modification of track membranes by low temperature plasma leads to the creation of “smart” membranes, which possess some unique properties. This allows to significantly expand the areas of their application. Modified membranes can be used as thermosensitive elements and mechanochemical membranes with a “chemical valve”.The plasma treatment allows also significantly change the biocompatibility of the surface of track-etched membranes and use them in medicine and biology. By means of some special techniques, studies of the adsorption and growth of cellular and biological structures on the surface of modified track-etched membranes are presented.The possibility of the modified track membranes using as a highly effective biocompatible drainage material in the surgical treatment of refractory glaucoma, as well as implants in the treatment of bullous keratopathy is shown.Forcitation:Kravets L.I.,Gilman A.B. Modification of track-etched membranes by low-temperature plasma. Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol. 2018. V. 61. N 4-5. P. 4-30